Case Study: The Role of Process Control Systems in Film Deposition Tools

Introduction

The semiconductor industry is the main technological sector moving forward. It is running developments in computing, telecommunications, and electronics. The core part of semiconductor manufacturing is the film deposition which is done by using vapor phase growth, which makes a very thin layer of material to create ICs. Thus, process control systems are essential for these operations. They ensure the required quality, reliability, and scalability of them.

The semiconductor sector in India is getting bigger and stronger with the chipset manufacturers and the leading semiconductor companies like Nanogenius Technologies playing a vital role by enhancing the country’s whole ecosystem of technology.

The case study will cover the real importance of process control systems in film deposition equipment and their applications, challenges, and effects in the semiconductor manufacturing industry in India.

What is Film Deposition?

Film deposition is a method of building up a specified material over a substrate via adhesion and formation of thin films. The function of these films is to act as conductors, insulators, or protective layers in semiconductor devices. The two basic methods of deposition of the film are:

Physical Vapor Deposition (PVD): A process where materials are vaporized in a vacuum and condensed onto the substrate.

Chemical Vapor Deposition (CVD):  A method involving chemical reactions to deposit thin films onto a substrate.

Both techniques of the kind require the highest accuracy to be able to deliver the extremely stringent specifications of semiconductor production.

Role of Process Control Systems in Film Deposition

Companies like NanoGenius Technologies contribute by integrating their advanced engineering solutions to improve these systems. Process control systems have come to play a key role in overcoming the film deposition challenges through the following mechanism:

1. Real-Time Monitoring and Feedback

• Sensors continually monitor key parameters like temperature, pressure, gas flow, and film thickness.
• The feedback loops are created, enabled by control algorithms that dynamically adjust these parameters toward maintaining desired conditions.

Example: In plasma-enhanced CVD, optical emission spectroscopy monitors plasma composition, allowing for adjustment of precursor flow rates to ensure consistent film deposition.

2. Automation and Precision

• Process control systems automate complex sequences, reducing human error and improving repeatability.
• Systems manage multi-layer deposition processes, ensuring precise transitions between layers.

Example: Atomic Layer Deposition (ALD) relies on alternating precursor pulses, which are timed and controlled automatically for atomic-scale accuracy.

3. Advanced Control Algorithms

• PID controllers control parameters with great accuracy.
• Machine learning algorithms predict and correct deviations using historical data.

Example: Machine learning models in sputtering optimize magnetron power levels to minimize target erosion and improve uniformity.

4. Defect Detection and Prevention

• Integrated diagnostic tools provide immediate anomaly detection, and corrections can be made on time.
• Closed-loop controls reduce defects by maintaining a stable process condition.

Example: Optical coherence tomography can detect micro-defects in films, and adjustments in the system are done automatically.

5. Energy and Resource Optimization

• Control systems minimize wastage through fine-tuning the use of resources.
• Energy-efficient deposition processes reduce operational costs as well as environmental impact.

Example: Variable-frequency drives for vacuum pumps optimize power use during low-load phases.

Challenges in Film Deposition

Despite the progress in technology, the process of film deposition continues to encounter numerous obstacles, particularly for semiconductor manufacturing firms in India:

Miniaturization Challenges:

As manufacturers transition to smaller nodes such as 5nm and 3nm, achieving consistent film thickness and quality becomes increasingly challenging.

Material Limitations:

The adoption of new materials for cutting-edge chipsets necessitates meticulous control to prevent compatibility issues and ensure effective deposition.

High Equipment Costs:

The sophisticated deposition machinery and control systems are costly, posing significant challenges for emerging companies striving to compete with established global leaders.

Environmental Issues:

Addressing the environmental ramifications of the chemical processes utilized in chemical vapor deposition (CVD) and physical vapor deposition (PVD) remains a persistent challenge.

Film Deposition in Indian Semiconductor Manufacturing

India’s semiconductor manufacturing industry is still at a very nascent stage compared to the global leaders like Taiwan, USA, and South Korea. Nevertheless, programs from the Government of India such as “Semiconductor Mission” have made the progress in the sector much faster. Some kit manufacturing equipment and major semiconductor companies in India are adopting film deposition tools with advanced process control systems. Major Players in India:

• SPEL Semiconductor: It specializes in IC assembly and testing.
• SCL (Semiconductor Laboratory): Research and manufacturing for defence and space applications.
• Vedanta-Foxconn Joint Venture: Aims to create world-class fabrication facilities in India.

Case Example: Process Control Implementation in an Indian Semiconductor Facility

A leading chipset manufacturing company in India recently upgraded its deposition tools with next-generation process control systems. The aim was to improve the production of 28nm chipsets for domestic as well as export markets. The main steps involved were:

The adoption of In-Situ Monitoring Tools:

The company added sensors to measure film thickness and uniformity in real-time while performing CVD processes.

Optimization of Gas Flow Dynamics:

Advanced control algorithms were implemented to regulate the flow of precursor gas that ensure consistent deposition rates.

Leveraging AI and Machine Learning:

AI-based predictive maintenance systems reduced equipment downtime by 30%.

Attaining Sustainable Goals:

The company achieved its sustainability goals through the green deposition method, where the use of hazardous chemicals is optimized to meet international standards.

The Future of Film Deposition and Process Control in India

With aspirations to become a semiconductor manufacturing hub, India will need investment in advanced deposition tools and process control systems. Partnerships with global technology leaders and nurturing local innovation can fill the gaps in expertise and infrastructure.

Key recommendations are:

• Government Support: Sustained funding and policy support for R&D in semiconductor technology.
• Skill Development: Training Programs to an Achieved Skilled Workforce Capable of Operating Advanced Deposition Tools.
• Collaborative Ecosystem: partnership among academia, industry, and research institutions that fuels innovation.

Benefits of Process Control Systems

Improved Product Quality

• Ensures consistent film properties, meeting stringent industry standards.

Increased Throughput

• Automates processes, reducing cycle times and enabling high-volume manufacturing.

Cost Savings

• Minimizes material wastage and energy consumption.

Enhanced Scalability

• Maintains precision across larger substrates and diverse applications.

Regulatory Compliance

• Helps meet environmental and safety regulations by reducing emissions and optimizing resource usage.

Conclusion

Process control systems are the cornerstone of precision and efficiency in film deposition, a critical component of semiconductor manufacturing. For chipset manufacturing companies in India and top semiconductor manufacturers, embracing these systems is not merely an option but a necessity. With concerted efforts, India is poised to emerge as a significant player in the global semiconductor market, leveraging advanced process control systems to propel its technological and economic growth. With a rich experience in VLSI, FPGA, and ASIC design, Nanogenius Technologies is helping Indian manufacturers develop and produce top-notch products. Nanogenius enables Indian people to overcome challenges and, in turn, drive innovations to make India a major player in semiconductor technology on the global map.